Electronic screen photosensitive resist
1,Index
|
Item |
Index |
|
HS-DZⅣ |
|
Alcoholysis degree, %(mol／mol) |
91.5～93.5 |
|
Viscosity, mPa•s |
6.3～7.7 |
|
Fugitive constituent, %< |
5.0 |
|
Ash content, %< |
0.5 |
|
PH value |
5.0～7.0 |
|
Granularity |
20mesh |
2,Manufacturing method:
It is a kind of modification polyvinyl alcohol manufactured by copolymerization modification, special soluble mode and post-processing treatment, and it is a water-soluble macromolecular polymer used in electronic industry.
3,Properties
Water-soluble: soluble in water with transparent water solution.
Chemical resistance: at usual temperature, the PH value of its water solution is about 5-7 with steady viscosity. It will not be impacted by weak acid, weak alkali and organic solvent (ester, ketone, higher alcohols and hydrocarbon) with high oil-resistance.
4,Use
It is mainly used for photosensitive resist of electronic screen. It has steady viscosity with good adhesiveness; It has well solubility with little bubble. It is able to form even film and has excellent photosensitive performance.
5,Using method
1, Weight: it is weighed according to demand.
2, Put the weighted cool water into the dissolving tank and start to stir it.
3, Put it into dissolving tank slowly in case of caking.
4, Stirring it to make it fully swelling.
5, Heat it gradually and make the temperature to 90-95°C in 30 minutes (Notice: do not heat it quickly and the temperature should not be so high.), and then keep stirring for 60 minutes.
6. Reduce the temperature of the solution by stirring to below 30℃, and then put the transparent solution into dissolving tank and get some sample for analyzing its solid content. |
